Laterally graded multilayer as x-ray mirror for the laser-induced plasma x-ray sources

Xianchao Cheng; Bozhong Tan; Jinming Cheng; Dongbing Liu; Jian Mu; Qingguo Yang

doi:10.1117/12.2272376

23 August 2017 Laterally graded multilayer as x-ray mirror for the laser-induced plasma x-ray sources

Xianchao Cheng, Bozhong Tan, Jinming Cheng, Dongbing Liu, Jian Mu, Qingguo Yang

Proceedings Volume 10386, Advances in X-Ray/EUV Optics and Components XII; 1038604 (2017) https://doi.org/10.1117/12.2272376
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

The laser-induced plasma sources give instantaneous 4π divergent x-ray beams. The x-ray source size and pulse duration depend on the properties of the high-energy laser. Copper is the typical target material giving characteristic photon energies around 8.4keV. Different shapes of bent crystals are widely used as imaging and monochromatizing optics. Focusing and collimating are normally functioned by polycapillary x-ray lenses. Especially, the laterally-graded multilayers are applied as x-ray mirrors, which can reflect hard x-rays with big grazing angles, moderate energy resolution and high reflectivities. To get larger acceptance angel, a higher gradient of bilayer thicknesses from 2nm to 3.6nm within 80mm length scale is designed. And the alignment precision of 10μm is required to make it good performance. The reflected monochromatic x-rays can enhance the traverse coherence for the phase contrast imaging. And multi-frames of the same object can be obtained instantaneously by multi-reflections of the mirrors. The laterally-graded multilayer x-ray mirrors are also used for the pinhole imaging of a Z-pinch target, which benefits from the flat reflection surface and monochromatic imaging.

Conference Presentation

Citation Download Citation

Xianchao Cheng, Bozhong Tan, Jinming Cheng, Dongbing Liu, Jian Mu, and Qingguo Yang "Laterally graded multilayer as x-ray mirror for the laser-induced plasma x-ray sources", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 1038604 (23 August 2017); https://doi.org/10.1117/12.2272376

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