1550-nm photonic crystal lasers fabricated by maskless digital photolithography

Minsu Kang; Heesoo Jin; Heonsu Jeon

doi:10.1117/12.2649486

19 April 2023 1550-nm photonic crystal lasers fabricated by maskless digital photolithography

Minsu Kang, Heesoo Jin, Heonsu Jeon

Proceedings Volume PC12435, Emerging Digital Micromirror Device Based Systems and Applications XV; PC1243504 (2023) https://doi.org/10.1117/12.2649486
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

Maskless digital photolithography is a relatively new lithographic technique in which micrometer-scale pattern layouts can be configured conveniently by an electrically-addressable digital-micromirror-device. The authors’ group has been systematically looking into the possibility of generating submicron patterns using the technique, starting with photonic crystal (PhC) laser structures. Pattern tilting and grayscale exposure techniques are employed to fine-tune the PhC lattice constant and also to generate PhC patterns other than square-lattice structure. Diffraction effects are also taken into account carefully to generate non-periodic PhC patterns. The resultant PhC lasers exhibit laser performance comparable to those fabricated by electron-beam lithography.

Conference Presentation

Citation Download Citation

Minsu Kang, Heesoo Jin, and Heonsu Jeon "1550-nm photonic crystal lasers fabricated by maskless digital photolithography", Proc. SPIE PC12435, Emerging Digital Micromirror Device Based Systems and Applications XV, PC1243504 (19 April 2023); https://doi.org/10.1117/12.2649486

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