Ion beam lithography preparation of the transparent conductive film of metal grating

Song-lin Wang; Gao-yuan Mi; Chong-min Yang; Jian-fu Zhang; Ying-hui Wang; Qing-long Liu; Ming-wei Li

doi:10.1117/12.2307486

5 March 2018 Ion beam lithography preparation of the transparent conductive film of metal grating

Song-lin Wang, Gao-yuan Mi, Chong-min Yang, Jian-fu Zhang, Ying-hui Wang, Qing-long Liu, Ming-wei Li

Proceedings Volume 10710, Young Scientists Forum 2017; 107100K (2018) https://doi.org/10.1117/12.2307486
Event: Young Scientists Forum 2017, 2017, Shanghai, China

Abstract

Transparent conductive films of metal grating have been prepared by ion beam lithography method. The surface appearance and thickness of films were measured by atomic force microscope (AFM). Metal grating thickness uniformity has been improved to 2.34% when the flap was used to correction. Visible and near-infrared transparent have been measured by Lambda 900 spectrophotometer.

Citation Download Citation

Song-lin Wang, Gao-yuan Mi, Chong-min Yang, Jian-fu Zhang, Ying-hui Wang, Qing-long Liu, and Ming-wei Li "Ion beam lithography preparation of the transparent conductive film of metal grating", Proc. SPIE 10710, Young Scientists Forum 2017, 107100K (5 March 2018); https://doi.org/10.1117/12.2307486

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